Methacrylate resists and antireflective coatings for 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 174-185

  Taylor, G ^a   Trefonas, P ^a   Szmanda, C ^a   Barclay, G ^a   Kavanagh, R ^a   Blacksmith, R ^a   Joesten, L ^a   Monaghan, M ^a   Coley, S ^a   Mao, Z ^a   Cameron, J ^a   Hardy, R ^a   Gronbeck, D ^a   Connolly, S ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; ANTIREFLECTION COATINGS; PLASMA ETCHING; POLYMETHYL METHACRYLATES;

CHEMICAL AMPLIFICATION;

PHOTORESISTS;

EID: 0032670587     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350199     Document Type: Conference Paper

References (8)