Computer simulation of metal complex dissociation during free metal determination using anodic stripping voltammetry

Computers and Chemistry

Volumn 23, Issue 1, 1999, Pages 61-68

  Tao, Shu ^a   Lam, Kin Che ^b   Cao, Jun ^a   Li, Bengang ^a  

^a PEKING UNIVERSITY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

ASV; Complexation capacity; Computer simulation; Diffusion layer; Free metal

Indexed keywords

COMPLEXATION; COMPUTER SIMULATION; COMPUTER SOFTWARE; DEPOSITION; ELECTRODES; IONS; MASS TRANSFER; MEASUREMENT ERRORS;

ANODIC STRIPPING VOLTAMMETRY; COMPLEXATION CAPACITY; FREE METAL;

DISSOCIATION;

EID: 0032670513     PISSN: 00978485     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0097-8485(98)00015-1     Document Type: Article

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