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Volumn , Issue , 1999, Pages 103-106
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Process development on the monolithic fabrication of an ultra-compact 4×4 optical switch matrix on InP/InGaAsP material
a a a a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
DRY ETCHING;
LIGHT REFLECTION;
MASKS;
MIRRORS;
REACTIVE ION ETCHING;
SEMICONDUCTING INDIUM PHOSPHIDE;
TOTAL INTERNAL REFLECTION (TIR);
OPTICAL SWITCHES;
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EID: 0032670453
PISSN: 10928669
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (10)
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References (12)
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