Properties of our developing next generation photomask substrate

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 41-52

  Takeuchi, Masaki ^a   Shibano, Yukio ^a   Kusama, Shinichi ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EXCIMER LASERS; FUSED SILICA; IMPURITIES; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SUBSTRATES; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

PHOTOMASKS;

MASKS;

EID: 0032670075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360230     Document Type: Conference Paper

References (6)