Plasma etching of NiFe/Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definition

Journal of Magnetism and Magnetic Materials

Volumn 198, Issue , 1999, Pages 204-206

  Jung, K B ^a   Hong, J ^a   Childress, J R ^b   Pearton, S J ^a   Sharifi, F ^a   Jenson, M ^c   Hurst Jr , A T ^c  

^a UNIVERSITY OF FLORIDA   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c HONEYWELL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COPPER; ELECTRON CYCLOTRON RESONANCE; MAGNETIC ANISOTROPY; METALLIC FILMS; METALLIC SUPERLATTICES; MULTILAYERS; NICKEL ALLOYS; PLASMA ETCHING; PLASMA SOURCES;

PLASMA CHEMISTRY;

MAGNETIC THIN FILMS;

EID: 0032666795     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(98)01074-9     Document Type: Article

References (6)

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2. G.A. Prinz, K. Hathaway, (Eds.), Physics Today, April 1995.
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5. Kinoshita K., Yamada K., Matutera H. IEEE Trans. Magn. 27:1991;4888.
6. Hong J., Caballero J.A., Lambers E.S., Childress J.R., Pearton S.J. J. Vac. Sci. Technol. A. 16(4):1998;2153.