Roughness characterization of ultra-smooth surfaces using common-path interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3619, Issue , 1999, Pages 121-127

  Wang, B S ^a   Marchese Ragona, S P ^a   Bristow, T C ^a  

^a Chapman Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; INTERFEROMETERS; SEMICONDUCTING GLASS; SEMICONDUCTING SILICON; SUBSTRATES; TRANSFER FUNCTIONS;

COMMON-PATH INTERFEROMETRY;

ROUGHNESS MEASUREMENT;

EID: 0032666773     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (16)