New ultra-hard etch-stop layer for high precision micromachining

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1999, Pages 205-210

  Borenstein, J T ^a   Gerrish, N D ^a   Currie, M T ^a   Fitzgerald, E A ^a  

^a CHARLES STARK DRAPER LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GERMANIUM ALLOYS; GYROSCOPES; MICROMACHINING; SILICON ALLOYS;

ETCH-STOP LAYERS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032665780     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)