Surface analysis of boron-doped polycrystalline diamond films deposited by a microwave plasma chemical vapor deposition system

Materials Chemistry and Physics

Volumn 59, Issue 2, 1999, Pages 143-148

  Huang, B R ^a   Wu, C H ^a   Ke, W Z ^a  

^a NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BORON; CHEMICAL BONDS; DOPING (ADDITIVES); GRAIN BOUNDARIES; ION IMPLANTATION; OXIDATION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SILICON; SYNTHESIS (CHEMICAL);

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0032665113     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(99)00036-X     Document Type: Article

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