Role of acid charge in chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 342-347

  Shi, Xuelong ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN GASES; ELECTRIC CHARGE; EVAPORATION; INTERFACES (MATERIALS); KINETIC THEORY; PERMITTIVITY; ULTRAVIOLET RADIATION; VAPOR PRESSURE;

ACID DIFFUSION; CHEMICALLY AMPLIFIED RESISTS; COULOMB INTERACTION;

PHOTORESISTS;

EID: 0032663972     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350267     Document Type: Conference Paper

References (34)