Stress formation and relaxation in amorphous Ta-Cr films

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 205-209

  Andersen, P ^a   Moske, M ^b   Dyrbye, K ^a   Bottiger J ^c  

^a Grundfos DK AS   (Denmark)

^b UNIVERSITY OF AUGSBURG   (Germany)

^c AARHUS UNIVERSITY   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHROMIUM; COMPRESSIVE STRESS; FILM GROWTH; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; MECHANICAL VARIABLES MEASUREMENT; STRESS RELAXATION; SUBSTRATES; TANTALUM ALLOYS; TENSILE STRESS;

CANTILEVER BEAM TECHNIQUE; STONEY FORMULA; STRESS MEASUREMENT;

THIN FILMS;

EID: 0032663890     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01452-7     Document Type: Article

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