-
1
-
-
36549092192
-
Cooperative growth phenomena in silicon/germanium low-temperature epitaxy
-
Meyerson B S, Uram K J and LeGoues F K 1988 Cooperative growth phenomena in silicon/germanium low-temperature epitaxy Appl. Phys. Lett. 53 2555
-
(1988)
Appl. Phys. Lett.
, vol.53
, pp. 2555
-
-
Meyerson, B.S.1
Uram, K.J.2
LeGoues, F.K.3
-
2
-
-
36449008424
-
Extremely high electron mobility in Si/SiGe modulation doped heterostructures
-
Ismail K, Arafa M, Saenger K L, Chu J O and Meyerson B S 1995 Extremely high electron mobility in Si/SiGe modulation doped heterostructures Appl. Phys. Lett. 66 1077
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 1077
-
-
Ismail, K.1
Arafa, M.2
Saenger, K.L.3
Chu, J.O.4
Meyerson, B.S.5
-
3
-
-
0024752976
-
Heterojunction bipolar transistors using Si-Ge alloys
-
Iyer S S, Patton G L, Stork J M C, Meyerson B S and Harame D L 1989 Heterojunction bipolar transistors using Si-Ge alloys IEEE Trans. Electron Devices 36 2043
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, pp. 2043
-
-
Iyer, S.S.1
Patton, G.L.2
Stork, J.M.C.3
Meyerson, B.S.4
Harame, D.L.5
-
4
-
-
0029276715
-
Si/SiGe epitaxial-base transistors-part I: Materials, physics, and circuits
-
Harame D L, Comfort J H, Cressler J D, Crabbé E F, Sun J Y-C, Meyerson B S and Tice T 1995 Si/SiGe epitaxial-base transistors-part I: materials, physics, and circuits IEEE Trans. Electron Devices 42 455
-
(1995)
IEEE Trans. Electron Devices
, vol.42
, pp. 455
-
-
Harame, D.L.1
Comfort, J.H.2
Cressler, J.D.3
Crabbé, E.F.4
Sun, J.Y.-C.5
Meyerson, B.S.6
Tice, T.7
-
5
-
-
0029274349
-
Si/SiGe epitaxial-base transistors-part II: Process integration and analog applications
-
Harame D L, Comfort J H, Cressler J D, Crabbé E F, Sun J Y-C, Meyerson B S and Tice T 1995 Si/SiGe epitaxial-base transistors-part II: process integration and analog applications IEEE Trans. Electron Devices 42 469
-
(1995)
IEEE Trans. Electron Devices
, vol.42
, pp. 469
-
-
Harame, D.L.1
Comfort, J.H.2
Cressler, J.D.3
Crabbé, E.F.4
Sun, J.Y.-C.5
Meyerson, B.S.6
Tice, T.7
-
6
-
-
0029271142
-
Re-engineering silicon: SiGe heterojunction bipolar technology
-
Cressler J D 1995 Re-engineering silicon: SiGe heterojunction bipolar technology IEEE Spectrum 32 49
-
(1995)
IEEE Spectrum
, vol.32
, pp. 49
-
-
Cressler, J.D.1
-
7
-
-
0030083354
-
RF analog and digital circuits in SiGe technology
-
Long J R, Copeland M A, Kovacic S J, Malhi D S, Harame D L and Wuorinen J H 1996 RF analog and digital circuits in SiGe technology ISSCC: IEEE Int. Solid-State Circuits Conf. (Digest of Technical Papers (San Francisco, CA) vol 82 p 423
-
(1996)
ISSCC: IEEE Int. Solid-State Circuits Conf. Digest of Technical Papers (San Francisco, CA)
, vol.82
, pp. 423
-
-
Long, J.R.1
Copeland, M.A.2
Kovacic, S.J.3
Malhi, D.S.4
Harame, D.L.5
Wuorinen, J.H.6
-
8
-
-
0024886320
-
Silicon-germanium alloys and heterostructures: Optical and electronic properties
-
Pearsall T P 1989 Silicon-germanium alloys and heterostructures: optical and electronic properties CRC Crit. Rev. Solid State Mater. Sci. 15 551
-
(1989)
CRC Crit. Rev. Solid State Mater. Sci.
, vol.15
, pp. 551
-
-
Pearsall, T.P.1
-
9
-
-
85058698601
-
NMOS and PMOS transistors fabricated in strained silicon/relaxed silicon-germanium structures
-
Welser J, Hoyt J L and Gibbons J F 1992 NMOS and PMOS transistors fabricated in strained silicon/relaxed silicon-germanium structures IEDM Tech. Dig. 1000
-
(1992)
IEDM Tech. Dig.
, pp. 1000
-
-
Welser, J.1
Hoyt, J.L.2
Gibbons, J.F.3
-
11
-
-
0027839374
-
Evidence of real-space hot-electron transfer in high mobility strained-Si multilayer MOSFETs
-
Welser J, Hoyt J L and Gibbons J F 1993 Evidence of real-space hot-electron transfer in high mobility strained-Si multilayer MOSFETs IEDM Tech. Dig. 545
-
(1993)
IEDM Tech. Dig.
, pp. 545
-
-
Welser, J.1
Hoyt, J.L.2
Gibbons, J.F.3
-
16
-
-
0000741169
-
Comparative study of phonon-limited mobility of two-dimensional electrons in strained and unstrained Si metal-oxide-semiconductor field-effect transistors
-
Takagi S, Hoyt J L, Welser J J and Gibbons J F 1996 Comparative study of phonon-limited mobility of two-dimensional electrons in strained and unstrained Si metal-oxide-semiconductor field-effect transistors J. Appl. Phys. 80 1567
-
(1996)
J. Appl. Phys.
, vol.80
, pp. 1567
-
-
Takagi, S.1
Hoyt, J.L.2
Welser, J.J.3
Gibbons, J.F.4
-
19
-
-
0016116644
-
Design of ion-implanted MOSFETÕs with very small physical dimensions
-
Dennard R H, Gaensslen F H, Yu H -N, Rideout V L, Bassous E and LeBlanc A R 1974 Design of ion-implanted MOSFETÕs with very small physical dimensions IEEE J. Solid-State Circuits 9 256
-
(1974)
IEEE J. Solid-State Circuits
, vol.9
, pp. 256
-
-
Dennard, R.H.1
Gaensslen, F.H.2
Yu, H.N.3
Rideout, V.L.4
Bassous, E.5
LeBlanc, A.R.6
-
23
-
-
0028747841
-
On the universality of inversion layer mobility in Si MOSFETÕs: Part I - Effects of substrate impurity concentration
-
Takagi S, Toriumi A, Iwase M and Tango H 1994 On the universality of inversion layer mobility in Si MOSFETÕs: part I - effects of substrate impurity concentration IEEE Trans. Electron Devices 41 2357
-
(1994)
IEEE Trans. Electron Devices
, vol.41
, pp. 2357
-
-
Takagi, S.1
Toriumi, A.2
Iwase, M.3
Tango, H.4
-
24
-
-
0024768003
-
Indium channel implants for improved MOSFET behavior at the 100-nm channel length regime
-
Shahidi G G, Antoniadis D A and Smith H I 1989 Indium channel implants for improved MOSFET behavior at the 100-nm channel length regime IEEE Trans. Electron Devices 36 2605
-
(1989)
IEEE Trans. Electron Devices
, vol.36
, pp. 2605
-
-
Shahidi, G.G.1
Antoniadis, D.A.2
Smith, H.I.3
-
25
-
-
0027641506
-
Indium channel implant for improved short-channel behavior of submicrometer NMOSFETs
-
Shahidi G G, Davari B, Bucelot T J, Ronsheim P A, Coane P J, Pollack S, Blair C R, Clark B and Hansen H H 1993 Indium channel implant for improved short-channel behavior of submicrometer NMOSFETs IEEE Electron Device Lett. 14 409
-
(1993)
IEEE Electron Device Lett.
, vol.14
, pp. 409
-
-
Shahidi, G.G.1
Davari, B.2
Bucelot, T.J.3
Ronsheim, P.A.4
Coane, P.J.5
Pollack, S.6
Blair, C.R.7
Clark, B.8
Hansen, H.H.9
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