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Volumn 10, Issue 2, 1999, Pages 147-152

Doping dependence of the mobility enhancement in surface-channel strained-Si layers

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EPITAXIAL GROWTH; HETEROJUNCTIONS; MATHEMATICAL MODELS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH;

EID: 0032663798     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/2/308     Document Type: Article
Times cited : (12)

References (25)
  • 1
    • 36549092192 scopus 로고
    • Cooperative growth phenomena in silicon/germanium low-temperature epitaxy
    • Meyerson B S, Uram K J and LeGoues F K 1988 Cooperative growth phenomena in silicon/germanium low-temperature epitaxy Appl. Phys. Lett. 53 2555
    • (1988) Appl. Phys. Lett. , vol.53 , pp. 2555
    • Meyerson, B.S.1    Uram, K.J.2    LeGoues, F.K.3
  • 6
    • 0029271142 scopus 로고
    • Re-engineering silicon: SiGe heterojunction bipolar technology
    • Cressler J D 1995 Re-engineering silicon: SiGe heterojunction bipolar technology IEEE Spectrum 32 49
    • (1995) IEEE Spectrum , vol.32 , pp. 49
    • Cressler, J.D.1
  • 8
    • 0024886320 scopus 로고
    • Silicon-germanium alloys and heterostructures: Optical and electronic properties
    • Pearsall T P 1989 Silicon-germanium alloys and heterostructures: optical and electronic properties CRC Crit. Rev. Solid State Mater. Sci. 15 551
    • (1989) CRC Crit. Rev. Solid State Mater. Sci. , vol.15 , pp. 551
    • Pearsall, T.P.1
  • 9
    • 85058698601 scopus 로고
    • NMOS and PMOS transistors fabricated in strained silicon/relaxed silicon-germanium structures
    • Welser J, Hoyt J L and Gibbons J F 1992 NMOS and PMOS transistors fabricated in strained silicon/relaxed silicon-germanium structures IEDM Tech. Dig. 1000
    • (1992) IEDM Tech. Dig. , pp. 1000
    • Welser, J.1    Hoyt, J.L.2    Gibbons, J.F.3
  • 11
    • 0027839374 scopus 로고
    • Evidence of real-space hot-electron transfer in high mobility strained-Si multilayer MOSFETs
    • Welser J, Hoyt J L and Gibbons J F 1993 Evidence of real-space hot-electron transfer in high mobility strained-Si multilayer MOSFETs IEDM Tech. Dig. 545
    • (1993) IEDM Tech. Dig. , pp. 545
    • Welser, J.1    Hoyt, J.L.2    Gibbons, J.F.3
  • 12
    • 0029491314 scopus 로고
    • Enhanced hole mobilities in surface-channel strained-Si p-MOSFETs
    • Rim K, Welser J, Hoyt J L and Gibbons J F 1995 Enhanced hole mobilities in surface-channel strained-Si p-MOSFETs IEDM Tech. Dig. 517
    • (1995) IEDM Tech. Dig. , pp. 517
    • Rim, K.1    Welser, J.2    Hoyt, J.L.3    Gibbons, J.F.4
  • 16
    • 0000741169 scopus 로고    scopus 로고
    • Comparative study of phonon-limited mobility of two-dimensional electrons in strained and unstrained Si metal-oxide-semiconductor field-effect transistors
    • Takagi S, Hoyt J L, Welser J J and Gibbons J F 1996 Comparative study of phonon-limited mobility of two-dimensional electrons in strained and unstrained Si metal-oxide-semiconductor field-effect transistors J. Appl. Phys. 80 1567
    • (1996) J. Appl. Phys. , vol.80 , pp. 1567
    • Takagi, S.1    Hoyt, J.L.2    Welser, J.J.3    Gibbons, J.F.4
  • 22
    • 0031118623 scopus 로고    scopus 로고
    • Scaled silicon MOSFETÕs: Universal mobility behavior
    • Vasileska D and Ferry D K 1997 Scaled silicon MOSFETÕs: universal mobility behavior IEEE Trans. Electron Devices 44 577
    • (1997) IEEE Trans. Electron Devices , vol.44 , pp. 577
    • Vasileska, D.1    Ferry, D.K.2
  • 23
    • 0028747841 scopus 로고
    • On the universality of inversion layer mobility in Si MOSFETÕs: Part I - Effects of substrate impurity concentration
    • Takagi S, Toriumi A, Iwase M and Tango H 1994 On the universality of inversion layer mobility in Si MOSFETÕs: part I - effects of substrate impurity concentration IEEE Trans. Electron Devices 41 2357
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2357
    • Takagi, S.1    Toriumi, A.2    Iwase, M.3    Tango, H.4
  • 24
    • 0024768003 scopus 로고
    • Indium channel implants for improved MOSFET behavior at the 100-nm channel length regime
    • Shahidi G G, Antoniadis D A and Smith H I 1989 Indium channel implants for improved MOSFET behavior at the 100-nm channel length regime IEEE Trans. Electron Devices 36 2605
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 2605
    • Shahidi, G.G.1    Antoniadis, D.A.2    Smith, H.I.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.