Non-chemically amplified 193 nm top surface imaging photoresist development: Polymer substituent and polydispersity effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 891-901

  Kim, Myoung Soo ^a   Kim, Hyoung Gi ^a   Kim, Hyeong Soo ^a   Baik, Ki Ho ^a   Johnson, Donald W ^a   Cernigliaro, George J ^a   Minsek, David W ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MASKS; POLYSTYRENES; SURFACE ROUGHNESS; THIN FILMS;

SILYLATION; TOP SURFACE IMAGING (TSI);

PHOTORESISTS;

EID: 0032663142     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350277     Document Type: Conference Paper

References (13)