Ion implantation technique as research tool for improving oxidation behaviour of TiAl based intermetallic alloys

Surface Engineering

Volumn 15, Issue 2, 1999, Pages 119-125

  Haanappel, V A C ^a   Stroosnijder, M F ^a  

^a JOINT RESEARCH CENTRE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYING ELEMENTS; BINARY ALLOYS; COMPOSITION EFFECTS; INTERMETALLICS; ION IMPLANTATION; NIOBIUM; OXIDATION; SILICON; TANTALUM; TUNGSTEN;

SCREENING TESTS;

TITANIUM ALLOYS;

EID: 0032662752     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708499101516452     Document Type: Article

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3. Y. SHIDA and H. ANADA: Corros. Sci., 1993, 35, 945.
4. S. TANIGUCHI: Mater. Corros., 1997, 48, 1.
5. M. F. STROOSNIJDER, H. J. SCHMUTZLER, V. A. C. HAANAPPEL, and J. D. SUNDERKÖTTER: Mater. Corros., 1997, 48, 40.
6. V. A. C. HAANAPPEL, R. HOFMAN, J. D. SUNDERKÖTTER, W. GLATZ, H. CLEMENS, and M. F. STROOSNIJDER: Oxid. Met., 1997, 48, 263.
7. J. D. SUNDERKÖTTER, H. J. SCHMUTZLER, V. A. C. HAANAPPEL, R. HOFMAN, W. GLATZ, and M. F. STROOSNIJDER: Intermetallics, 1997, 5, 525.