Effect of plasma treatment on crystallization behavior of amorphous silicon films

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 577-582

  Pangal, K ^a   Sturm, J C ^a   Wagner, S ^a  

^a PRINCETON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; HYDROGEN; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; SEMICONDUCTING FILMS; SILICON ON INSULATOR TECHNOLOGY;

PLASMA ENHANCED CRYSTALLIZATION;

SEMICONDUCTING SILICON;

EID: 0032662625     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)