Formation of Gd oxide thin films on (111)Si

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 120-123

  Chen, J C ^a   Shen, G H ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHEMICAL ANALYSIS; ENERGY DISPERSIVE SPECTROSCOPY; GADOLINIUM COMPOUNDS; MULTILAYERS; OXIDATION; OXYGEN; SEMICONDUCTING SILICON; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY;

GADOLINIUM OXIDE THIN FILMS; MULTILAYERED STRUCTURE; OXIDE LAYER;

THIN FILMS;

EID: 0032662202     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00663-1     Document Type: Article

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