Spinnable and UV-patternable hybrid sol-gel silica glass for direct semiconductor dielectric layer manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1252-1262

  Andrews, M P ^a   Zhang, P L ^a   Najafi, S I ^a   Kao, C ^a   Pasch, N ^a  

^a MCGILL UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; DIFFRACTION GRATINGS; FUSED SILICA; HYDROLYSIS; PHOTOPOLYMERIZATION; PHOTOSENSITIVE GLASS; PHOTOSENSITIVITY; POLYCONDENSATION; SEMICONDUCTOR DEVICE MANUFACTURE; SOL-GELS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION;

ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 0032662158     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350178     Document Type: Conference Paper

References (0)