Development of Cr-based attenuated phase shift mask process for 0.18 μm device generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 340-349

  Kagami, Ichiro ^a   Ishikawa, Kiichi ^a   Kakuta, Daichi ^a   Kawahira, Hiroichi ^a  

^a SONY CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; CRYSTAL DEFECTS; DRY ETCHING; ERROR ANALYSIS; EXCIMER LASERS; INSPECTION; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING;

ATTENUATED PHASE SHIFTING MASKS (ATT-PSM); CHEMICAL-AMPLIFICATION NEGATIVE-RESISTS; CRITICAL DIMENSION (CD) CONTROL;

MASKS;

EID: 0032660995     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360215     Document Type: Conference Paper

References (4)