Critical parameters in the sputter-deposition of NdBa2Cu3O7-δ thin films

Superconductor Science and Technology

Volumn 12, Issue 8, 1999, Pages 481-485

  Hakuraku, Y ^a   Mori, Z ^b   Koba, S ^b   Yokoyama, N ^a   Doi, T ^a   Inoue, T ^a  

^a KAGOSHIMA UNIVERSITY   (Japan)

^b KUMAMOTO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); MAGNESIA; MAGNETRON SPUTTERING; MORPHOLOGY; NEODYMIUM COMPOUNDS; OXIDATION; PRESSURE; SUBSTRATES; SUPERCONDUCTIVITY; SURFACES; TEMPERATURE;

CRITICAL PARAMETERS; DC MAGNETRON SPUTTERING; OXIDATION GAS PRESSURE; SPUTTERING TARGET; SUPERCONDUCTING PROPERTIES;

SUPERCONDUCTING FILMS;

EID: 0032660127     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/12/8/302     Document Type: Article

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