Growth and characterization of ferroelectric LaTiO3·5 thin films

Journal of the European Ceramic Society

Volumn 19, Issue 6-7, 1999, Pages 1493-1496

  Fompeyrine, J ^a   Seo, J W ^a,b   Locquet, J P ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

^b UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

Electron microscopy; Ferroelectric properties; Films; Perovskites.; X ray methods

Indexed keywords

EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; LANTHANUM COMPOUNDS; MOLECULAR BEAM EPITAXY; OXYGEN; PEROVSKITE; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRONTIUM COMPOUNDS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

FERROELECTRIC PROPERTIES; GROWTH MECHANISM; OXYGEN CONTENT;

THIN FILMS;

EID: 0032659449     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0955-2219(98)00463-4     Document Type: Article

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