Advanced Cr dry etching process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 137-146

  Aoyama, Satoshi ^a   Sakamoto, Shouichi ^a   Koike, Tutomu ^a   Yoshioka, Nobuyuki ^a   Harashima, Noriyuki ^a   Hayashi, Atsushi ^a   Sasaki, Takaei ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DRY ETCHING; DYNAMIC RANDOM ACCESS STORAGE; HYDROCHLORIC ACID; HYDROGEN; LOGIC DEVICES; MIXTURES; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION (CD) UNIFORMITY; MAGNETICALLY ENHANCED REACTIVE ION ETCHING (MERIE); PHOTOMASKS;

MASKS;

EID: 0032657933     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360246     Document Type: Conference Paper

References (5)