New reactive pulsed laser ablation technique for the deposition of hard carbon and carbon-nitride thin films

Materials Letters

Volumn 39, Issue 2, 1999, Pages 97-102

  Alexandrou, I ^a   Zergioti, I ^b   Amaratunga, G A J ^a   Healy, M J F ^c   Kiely, C J ^a   Hatto, P ^d   Velegrakis, M ^b   Fotakis, C ^b  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^c CRANFIELD UNIVERSITY   (United Kingdom)

^d Multi Arc UK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; FULLERENES; HELIUM; INCLUSIONS; LASER ABLATION; MICROHARDNESS; MICROSTRUCTURE; NITRIDES; NITROGEN; NOZZLES; PULSED LASER APPLICATIONS; THIN FILMS;

CARBON NITRIDE; PULSED LASER DEPOSITION (PLD);

AMORPHOUS FILMS;

EID: 0032656927     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(98)00223-7     Document Type: Article

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