Integration of alternating phase shift mask technology into optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 548-555

  Thiele, Jorg ^a   Friedrich, Christoph ^a   Dolainsky, Christoph ^a   Karakatsanis, Paul ^a   Maurer, Wilhelm ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; PHASE SHIFT;

CRITICAL DIMENSION (CD); OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0032656692     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354367     Document Type: Conference Paper

References (5)