Characterization of conductive probes for Atomic Force Microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3680, Issue II, 1999, Pages 1168-1179

  Trenkler, T ^a   Hantschel, T ^a   Vandervorst, W ^a   Hellemans, L ^a   Kulisch, W ^a   Oesterschulze, E ^a   Niedermann, P ^a   Sulzbach, T ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRON MICROSCOPY; NANOTECHNOLOGY; ROUGHNESS MEASUREMENT; SEMICONDUCTING SILICON; SILICON SENSORS;

NANOPOTENTIOMETRY; SCANNING CAPACITANCE MICROSCOPY (SCM); SCANNING SPREADING RESISTANCE MICROSCOPY (SSRM);

ATOMIC FORCE MICROSCOPY;

EID: 0032656682     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.341191     Document Type: Conference Paper

References (21)