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Volumn 14, Issue 4, 1999, Pages 345-349
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Characterization of heavy deposits on InP mesa sidewalls reactive ion etched using CH4/H2 plasma
a a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
CONTAMINATION;
ETCHING;
GOLD;
HYDROGEN;
MASKS;
METHANE;
PLASMA ETCHING;
REACTIVE ION ETCHING;
SILICA;
TITANIUM;
TRANSMISSION ELECTRON MICROSCOPY;
TUNGSTEN;
MESA SIDEWALLS;
X-RAY MICROANALYSIS;
SEMICONDUCTING INDIUM PHOSPHIDE;
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EID: 0032656198
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/14/4/011 Document Type: Article |
Times cited : (2)
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References (9)
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