Characterization of heavy deposits on InP mesa sidewalls reactive ion etched using CH4/H2 plasma

Semiconductor Science and Technology

Volumn 14, Issue 4, 1999, Pages 345-349

  Lee, Byung Teak ^a   Park, Jong Sahm ^a   Kim, Dong Keun ^a   Ahn, Ju Heon ^b  

^a Chonnam National University   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ETCHING; GOLD; HYDROGEN; MASKS; METHANE; PLASMA ETCHING; REACTIVE ION ETCHING; SILICA; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

MESA SIDEWALLS; X-RAY MICROANALYSIS;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0032656198     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/4/011     Document Type: Article

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