메뉴 건너뛰기




Volumn 14, Issue 4, 1999, Pages 345-349

Characterization of heavy deposits on InP mesa sidewalls reactive ion etched using CH4/H2 plasma

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ETCHING; GOLD; HYDROGEN; MASKS; METHANE; PLASMA ETCHING; REACTIVE ION ETCHING; SILICA; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN;

EID: 0032656198     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/4/011     Document Type: Article
Times cited : (2)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.