Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 975-980

  Wang, Yongqian ^a   Liao, Xianbo ^a   Diao, Hongwei ^a   He, Jie ^a   Ma, Zhixun ^a   Yue, Guozhen ^a   Sheng, Shuran ^a   Kong, Guanglin ^a   Zhao, Yuwen ^a   Li, Zhongming ^a   Yun, Feng ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; X RAY CRYSTALLOGRAPHY;

PULSE RAPID THERMAL PROCESSING (PRTP); SOLID PHASE CRYSTALLIZATION;

SEMICONDUCTING FILMS;

EID: 0032655933     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (22)