Comparison of anisotropic etching properties between KOH and TMAH solutions

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1999, Pages 315-320

  Shikida, Mitsuhiro ^a   Sato, Kazuo ^a   Tokoro, Kenji ^a   Uchikawa, Daisuke ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ETCHING; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SOLUTIONS;

ANISOTROPIC ETCHING;

MICROELECTRONIC PROCESSING;

EID: 0032655721     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.1999.746845     Document Type: Conference Paper

References (6)