Application of α-C:H films to masking etching of silicon dioxide

Microelectronics Journal

Volumn 30, Issue 9, 1999, Pages 833-836

  Fissore, A ^a   Alves, M A R ^a   Da Silva Braga, E ^a   Cescato, L ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; CHEMICAL VAPOR DEPOSITION; ETCHING; FLUORINE COMPOUNDS; HYDROGENATION; MASKS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; THIN FILMS;

FLUORIDRIC ACID; LIFT-OFF PROCESS;

SEMICONDUCTING FILMS;

EID: 0032655405     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(99)00018-X     Document Type: Article

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