Experimental study of line end shortening

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 777-784

  Shi, Xuelong ^a   Socha, Bob ^a   Bendik, Joe ^a   Dusa, Mircea ^a   Conley, Will ^a   Su, Bo ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; IMAGING TECHNIQUES; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY;

LINE END SHORTENING;

PHOTORESISTS;

EID: 0032654755     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350266     Document Type: Conference Paper

References (1)