Atomic-scale electron beam processing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 3 A, 1999, Pages 1595-

  Kizuka, Tokushi ^a,b   Yanaka, Takashi ^c  

^a NAGOYA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c TOPCON CORPORATION   (Japan)

Author keywords

Atomic fabrication; Electron beam processing; High resolution transmission electron microscopy; In situ microscopy; Magnesium oxide

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; IN SITU PROCESSING; MAGNESIA; NANOSTRUCTURED MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC FABRICATION; ELECTRON BEAM PROCESSING; IN SITU MICROSCOPY;

ELECTRON BEAMS;

EID: 0032654641     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.1595     Document Type: Article

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