Colorimetric properties of TiN thin films prepared by the Facing Targets Sputtering system

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 63, Issue 7, 1999, Pages 944-948

  Nose, Masateru ^a   Nagae, Takekazu ^a   Yokota, Masaru ^a   Saji, Shigeoki ^a   Nakada, Mikiko ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COLORIMETRY; FILM PREPARATION; SHOT PEENING; SPUTTERING; THIN FILMS;

CHROMATICITY; DIRECT CURRENT REACTIVE SPUTTERING;

TITANIUM NITRIDE;

EID: 0032654557     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.63.7_944     Document Type: Article

References (21)