FT-IR method to determine Dill's C parameter for DNQ/novolac resists with e-beam and i-line exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1263-1272

  Fedynyshyn, Theodore H ^a   Doran, Scott P ^a   Mack, Chris A ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; BACKSCATTERING; COMPUTER SOFTWARE; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT ABSORPTION; LIGHT TRANSMISSION;

DILL'S C PARAMETER;

PHOTORESISTS;

EID: 0032653145     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350179     Document Type: Conference Paper

References (4)