Reaction processes for low temperature (<150 °C) plasma enhanced deposition of hydrogenated amorphous silicon thin film transistors on transparent plastic substrates

Materials Research Society Symposium - Proceedings

Volumn 507, Issue , 1999, Pages 19-24

  Parsons, Gregory N ^a   Yang, Chien Sheng ^a   Klein, Tonya M ^a   Smith, Laura ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; AMORPHOUS SILICON; CHEMICAL BONDS; LOW TEMPERATURE OPERATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERS; SEMICONDUCTOR DEVICE MANUFACTURE; SILANES; SILICON NITRIDE;

TRANSPARENT PLASTIC SUBSTRATES;

THIN FILM TRANSISTORS;

EID: 0032652155     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)