New silica glass for 157 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 827-833

  Ikula, Y ^a   Kikugawa, S ^a   Masui, A ^a   Shimodaira, N ^a   Yoshizawa, S ^a   Hirano, M ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FUSED SILICA; HYDROGEN BONDS; IRRADIATION; LIGHT TRANSMISSION; ULTRAVIOLET RADIATION;

PROJECTION PHOTOLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0032652067     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)