Chemical vapor etching of copper using oxygen and 1,1,1,5,5,5-hexafluoro-2,4-pentanedione

Thin Solid Films

Volumn 342, Issue 1, 1999, Pages 221-229

  Steger, Richard ^a   Masel, Rich ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; MORPHOLOGY; OXIDATION; PARTIAL PRESSURE;

CHEMICAL VAPOR ETCHING;

COPPER;

EID: 0032651504     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01157-2     Document Type: Article

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