Molecular beam epitaxial growth and structures of Al/Ag superlattices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 3 A, 1999, Pages 1539-1546

  Kingetsu, Toshiki ^a   Kamada, Yasuhiro ^b   Yamamoto, Masahiko ^b  

^a RIGAKU CORPORATION   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Al Ag superlattice; Crystal growth; Growth temperature; MgO substrate; Molecular beam epitaxy; Reflection high energy electron diffraction; Structure; X ray diffraction

Indexed keywords

ALUMINUM; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; MAGNESIA; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILVER; SURFACE STRUCTURE; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

BILAYER DEPOSITION; GROWTH ORIENTATION;

SEMICONDUCTOR SUPERLATTICES;

EID: 0032651232     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.1539     Document Type: Article

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