Molecular dynamics simulations of Ion-induced rearrangement of ultrathin oxide films on silicon

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 106-107

  Kubota, Alison A ^a   Economou, Demeter J ^a  

^a University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; COMPUTER SIMULATION; ION BOMBARDMENT; MOLECULAR DYNAMICS; OXIDES; OXYGEN; POSITIVE IONS; SILICON; SPUTTERING; SURFACE CLEANING;

ION INDUCED REARRANGEMENT; OXIDE ISLAND; ULTRATHIN OXIDE FILMS;

ULTRATHIN FILMS;

EID: 0032650245     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763068     Document Type: Article

References (9)

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