Metastable defects in oxide thin films

Key Engineering Materials

Volumn 169, Issue , 1999, Pages 155-158

  Komatsu, M ^a   Ogino, T ^b   Hishita, S ^a   Oyoshi, K ^a   Ohashi, N ^c   Haneda, H ^a   Takenaka, T ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CERAMIC COATINGS; CRYSTAL DEFECTS; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; HALL EFFECT; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SPUTTER DEPOSITION; THIN FILMS; ZINC OXIDE;

HALL COEFFICIENTS; METASTABLE DEFECTS;

CONDUCTIVE FILMS;

EID: 0032649970     PISSN: 10139826     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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