Anti-reflective coating optimization techniques for sub-0.2 μm geometries

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 457-467

  Lucas, K ^a   Cook, C ^a   Lee, K ^a   Vasquez, J ^a   Montgomery, B ^a   Wehmer, K ^a   Filipiak, S ^a   O'meara, D ^a   King, C ^a   Phillips, A ^a   Ho, B ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; CALIBRATION; ELLIPSOMETRY; OPTIMIZATION; PROCESS CONTROL;

EXPOSURE LATITUDE REDUCTION; SINGLE WAFER OPTIMIZATION;

PHOTOLITHOGRAPHY;

EID: 0032647901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350832     Document Type: Conference Paper

References (0)