Carbon-rich cyclopolymers: Their synthesis, etch resistance, and application to 193 nm microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 94-101

  Pasini, Dario ^a   Low, Eric ^a   Meagley, Robert P ^a   Frechet, Jean M J ^a   Willson, C Grant ^a   Byers, Jeffrey D ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERIZATION; COPOLYMERS; ETCHING; SYNTHESIS (CHEMICAL); TRANSPARENCY;

CHEMICAL AMPLIFICATION; CYCLOPOLYMERIZATION; PHOTOACID GENERATORS;

PHOTORESISTS;

EID: 0032647639     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350166     Document Type: Conference Paper

References (19)