A new method for the precise measurement of wafer roll off of silicon polished wafer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 1, 1999, Pages 38-39

  Kimura, Masahiro ^a   Saito, Yasuo ^a   Daio, Hiroshi ^a   Yakushiji, Kenji ^a  

^a High Performance Materials Department   (Japan)

Author keywords

Block gauge; Capacitive gauging tool; Edge exclusion length; Polishing; Silicon wafer; STIR; Stylus profiler; Wafer roll off

Indexed keywords

CAPACITANCE MEASUREMENT; GAGES; POLISHING; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE MEASUREMENT;

BLOCK GAUGE; CAPACITIVE GAUGING TOOL; SITE TOTAL INDICATING READING; STYLUS PROFILER; WAFER ROLL OFF;

SILICON WAFERS;

EID: 0032647537     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.38.38     Document Type: Article

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