Reexamination of fluorine incorporation into SiO2 - significant improvement of charge-to-breakdown distribution tail

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1999, Pages 93-98

  Mitani, Y ^a   Satake, H ^a   Nakasaki, Y ^a   Toriumi, A ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN; FAILURE ANALYSIS; FLUORINE; HOT CARRIERS; MOS CAPACITORS; MOSFET DEVICES; SILICA; STRAIN; TRANSCONDUCTANCE; WEIBULL DISTRIBUTION;

DIELECTRIC BREAKDOWN; HOT ELECTRON STRESS;

INTEGRATED CIRCUIT TESTING;

EID: 0032646126     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)