Charge correction of the binding energy scale in XPS analysis of polymers using surface deposition of PDMS

Surface and Interface Analysis

Volumn 27, Issue 9, 1999, Pages 811-815

  Burrell, Michael C ^a   Chera, John J ^a  

^a GE GLOBAL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; FERMI LEVEL; INSULATING MATERIALS; POLYETHYLENES; X RAY PHOTOELECTRON SPECTROSCOPY;

CHARGE CORRECTION; POLYDIMETHYL SILICONE;

SILICONES;

EID: 0032646082     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199909)27:9<811::AID-SIA636>3.0.CO;2-W     Document Type: Article

References (8)

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3. J. Cros, Electron Spectrosc. Relat. Phenom. 59, 1 (1992).
4. M. C. Burrell and J. J. Chera, in Eastern Electron Spectroscopy Society Conference, May 1992.
5. J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, ed. by J. Chastain, Perkin-Elmer, Eden Prarie, MN p. 22 (1992).
6. S. Evans, in Handbook of X-ray and Ultraviolet Photoelectron Spectroscopy, ed. by D. Briggs, Chapt. 3, pp. 121-151. Heyden & Son, London (1977).
7. R. T. Lewis and M. A. Kelly, J. Electron Spectroc. Relat. Phenom. 20, 105 (1980).
8. M. C. Burrell and J. J. Chera, Appl. Surf. Sci. 35, 110, (1988).