Inhibition of alumina deposition during tungsten chemical mechanical planarization through the use of citric acid

Journal of the Electrochemical Society

Volumn 146, Issue 4, 1999, Pages 1442-1447

  Zhang, L ^a,c   Raghavan, S ^a   Meikle, S ^b   Hudson, G ^b  

^a University of Arizona   (United States)

^b MICRON TECHNOLOGY INC   (United States)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ALUMINA; CARBOXYLIC ACIDS; DISSOLUTION; ELECTROCHEMISTRY; IMAGE ANALYSIS; MASS SPECTROMETRY; METALLIC FILMS; PARTICLES (PARTICULATE MATTER); SCANNING ELECTRON MICROSCOPY; TUNGSTEN;

CHEMICAL MECHANICAL PLANARIZATION; CITRIC ACID; ZETA POTENTIAL MEASUREMENT;

CHEMICAL VAPOR DEPOSITION;

EID: 0032644218     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391783     Document Type: Article

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