SIMS depth profiling of TiOxNy films

Surface and Interface Analysis

Volumn 28, Issue 1, 1999, Pages 159-162

  Metson, J B ^a   Prince, K E ^b  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COPPER; CRYSTAL STRUCTURE; INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; SILICON; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TITANIUM COMPOUNDS;

DEPTH PROFILING; TITANIUM OXYNITRIDE;

AMORPHOUS FILMS;

EID: 0032642524     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199908)28:1<159::AID-SIA597>3.0.CO;2-4     Document Type: Article

References (8)

1. A. Bittar, D. Cochrane, S. Caughley and I. Vickeridge, J. Vac Sci Technol. A 15, 223 (1997).
2. L. J. Törnquist, A. Bittar and I. Vickeridge, Proceedings of Solar '97. Australian and New Zealand Solar Energy Society. (1997).
3. W. Assman, Th. Reichelt, T. Eisenhammer, H. Huber, A. Mahr, H. Schellinger and R. Wohlgemuth, Nucl. Inst. Phys. Res. B 113, 303 (1996).
4. Y. Gao, J. Appl. Phys. 64, 3760 (1988).
5. C. W. Magee, W. L. Harrington and E. M. Botnick, Int. J. Mass Spectrom. Ion Process. 103, 45 (1990).
6. Y. Gao, Y. Marie, F. Saldi and H. N. Migeon, SIMS IX, ed. by A. Benninghoven, Y. Nihei, R. Shimizu and H. W. Werner, pp. 382-385. Wiley, Chichester (1994).
7. J. M. Schroeer, H. Gnaser and H. Oechsner, SIMS IX, ed. by A. Benninghoven, Y. Nihei, R. Shimizu and H. W. Werner, pp. 386-389. Wiley, Chichester (1994).
8. K. Wittmaack, SIMS X, ed. by A. Benninghoven, B. Hagenhoff and H. U. Werner, pp. 39-46. Wiley, Chichester (1994).