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Volumn 67, Issue , 1999, Pages 255-259
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Large area device quality indium-tin-oxide thin films by magnetron sputtering
a a a a a a a
a
ENEA CR Portici
(Italy)
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER CONCENTRATION;
CARRIER MOBILITY;
CRYSTAL ORIENTATION;
ENERGY GAP;
FILM GROWTH;
GLASS;
HALL EFFECT;
INDIUM COMPOUNDS;
LIGHT ABSORPTION;
MAGNETRON SPUTTERING;
OXIDES;
SPUTTER DEPOSITION;
INDIUM TIN OXIDE;
TRANSPARENT CONDUCTING OXIDES (TCO);
CONDUCTIVE FILMS;
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EID: 0032642185
PISSN: 10120394
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (1)
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References (16)
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