Fabrication of surface gratings in GaAs and AlGaAs by electron beam lithography and chemically assisted ion beam etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3739, Issue , 1999, Pages 195-205

  Dienelt, J ^a   Otte, K ^a   Zimmer, K ^a   Pietag, F ^a   Bigl, F ^a  

^a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRON BEAM LITHOGRAPHY; ION BEAM LITHOGRAPHY; MASKS; POLYMETHYL METHACRYLATES; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR LASERS; SURFACE ROUGHNESS;

CHEMICALLY ASSISTED ION BEAM ETCHING;

DIFFRACTION GRATINGS;

EID: 0032639240     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (27)