Effect of CF4 addition on downflow ashing under atmospheric pressure

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 6 A, 1999, Pages 3731-3735

  Kataoka, Yoshinori ^a   Saito, Shuichi ^a   Omiya, Kayoko ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; DECOMPOSITION; ELECTRIC DISCHARGES; EXTRACTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OZONIZATION; PLASMA ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON TETRAFLUORIDES; DOWNFLOW ASHING PROCESS; OXIDATIVE DECOMPOSITIONS;

PHOTORESISTS;

EID: 0032638903     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.3731     Document Type: Article

References (8)

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