Temperature rise in a birefringent substrate caused by RF discharge plasma

Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)

Volumn 127, Issue 4, 1999, Pages 9-17

  Takaki, Koichi ^a   Sayama, Kunio ^a   Takahashi, Atsushi ^a   Fujiwara, Tamiya ^a   Nagata, Masakatsu ^a   Ono, Motoyuki ^a   Jani, Muaffaq Achmad ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; CARRIER CONCENTRATION; ELECTROMAGNETIC WAVES; HEAT FLUX; IONS; LIGHT INTERFERENCE; LITHIUM NIOBATE; PLASMAS; PRESSURE EFFECTS; SUBSTRATES; TEMPERATURE; TEMPERATURE DISTRIBUTION;

LASER INTERFERENCE; PLASMA PROCESS; RADIO FREQUENCY DISCHARGE PLASMA; SUBSTRATE TEMPERATURE;

PLASMA APPLICATIONS;

EID: 0032636490     PISSN: 04247760     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1520-6416(199906)127:4<9::AID-EEJ2>3.0.CO;2-5     Document Type: Article

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