Optimization criteria for SRAM design - lithography contribution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 847-859

  Cole, Daniel C ^a   Bula, Orest ^a   Conrad, Edward W ^a   Coops, Daniel ^a   Leipold, William C ^a   Mann, R W ^a   Oppold, Jeffrey H ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; ELECTRIC NETWORK SYNTHESIS; ELECTRIC NETWORK TOPOLOGY; INTEGRATED CIRCUIT LAYOUT; MASKS; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; OPTIMIZATION; RANDOM ACCESS STORAGE; STRAIN; STRESSES;

STATIC RANDOM ACCESS MEMORY (SRAM);

PHOTORESISTS;

EID: 0032635973     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354404     Document Type: Conference Paper

References (26)