Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy

Applied Surface Science

Volumn 148, Issue 3, 1999, Pages 215-222

  Tanaka, Katsumi ^a   Sakamoto, Takashi ^a   Tohara, Makoto ^a   Choo, Cheow Keong ^a   Nakata, Rhouhei ^a  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DEPOSITION; DESORPTION; FERMI LEVEL; HYDROCARBONS; LASER ABLATION; OXYGEN; POLYTETRAFLUOROETHYLENES; PULSED LASER APPLICATIONS; SURFACES; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON CLUSTERS; TETRAFLUOROCARBON; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; WORK FUNCTION;

SILICON;

EID: 0032632940     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00129-4     Document Type: Article

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